Open lengtemeetsystemen zijn ontwikkeld voor toepassingen in machines en installaties waar een hoge nauwkeurigheid verlangd wordt van de meetwaarde.
Typische toepassingen zijn:
- Meet- en productiemachines voor de semiconductor industrie
- Printplaat assembleermachines
- Ultra-precisie machines
- Nauwkeurige gereedschapsmachines
- Meetmachines, comparatoren en meetmicroscopen
- Directe aandrijvingen
Absolute position measurement
The LIC exposed linear encoders permit absolute position measurement both over large paths of traverse up to 27 m and at high traversing speed. In their dimensions and mounting, they match the LIDA 400.
± 0.08 µm
Up to 27040 mm
Incremental linear measurement
The LIP exposed linear encoders are characterized by very small measuring steps together with very high accuracy and repeatability. They operate according to the interferential scanning principle and feature a DIADUR phase grating as the measuring standard.
Up to ± 0.001 µm
Up to 3040 mm
The LIF exposed linear encoders have a measuring standard manufactured in the SUPRADUR process on a glass substrate and operate on the interferential scanning principle. They feature high accuracy and repeatability, are especially easy to mount, and have limit switches and homing tracks. The special version LIF 481 V can be used in high vacuum up to 10–7 bar (see separate Product Information sheet).
± 0.04 µm
Up to 1020 mm
The LIDA exposed linear encoders are specially designed for high traversing speeds up to 10 m/s, and are particularly easy to mount with various mounting possibilities. Steel scale tapes, glass or glass ceramic are used as carriers for METALLUR graduations, depending on the respective encoder. They also feature a limit switch.
Up to ± 0.2 µm
Up to 30040 mm
On the PP two-coordinate encoder, a planar phase-grating structure manufactured with the DIADUR process serves as the measuring standard, which is scanned interferentially. This makes it possible to measure positions in a plane.
± 0.04 µm
Measuring range 68x68mm